SIMULATION AND OPTIMIZATION OF PHASE-SHIFT MASKS FOR PRINTING OF CONTACT HOLES

Authors
PELKA J HENKE W
Citation
J. Pelka et W. Henke, SIMULATION AND OPTIMIZATION OF PHASE-SHIFT MASKS FOR PRINTING OF CONTACT HOLES, Microelectronic engineering, 26(1), 1994, pp. 1-26
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
26
Issue
1
Year of publication
1994
Pages
1 - 26
Database
ISI
SICI code
0167-9317(1994)26:1<1:SAOOPM>2.0.ZU;2-K
Abstract
Using the simulation program solid, comprehensive simulation studies w ere conducted on the use of phase-shift masks for contact holes in opt ical lithography. Emphasis was laid on the use of rim-type and outrigg er masks. Based on simulation findings, advantages and disadvantages o f this technology will be discussed, and aids for design and optimizat ion of phase-shifting mask areas will be given.