Sk. Chung et al., AN ANALYTICAL METHOD FOR 2-DIMENSIONAL FIELD DISTRIBUTION OF A MOS STRUCTURE WITH A FINITE-FIELD PLATE, I.E.E.E. transactions on electron devices, 42(1), 1995, pp. 192-194
An analytical method is presented for two-dimensional field distributi
on of a MOS structure with a field plate, which allows explicit equati
ons for field components in terms of oxide thickness, depletion width,
and field plate length. Useful design curves of breakdown voltage ver
sus substrate impurity concentration with oxide thickness and plate le
ngth as parameters are provided.