X. Chen et al., DRAG FORCE ACTING ON AN EVAPORATING PARTICLE IMMERSED IN A RAREFIED PLASMA-FLOW, Plasma chemistry and plasma processing, 15(1), 1995, pp. 1-23
Analytical expressions are presented for the drag force acting on an e
vaporating or nonevaporating particle immersed in a plasma flow for th
e extreme case of free-molecule flow regime and thin plasma sheath. It
is shown that the drag force on a spherical particle is proportional
to the square of the particle radius and to the relative velocity betw
een the particle and the bulk plasma at low speed ratios. The existenc
e of a relative velocity between the particle and the plasma results i
n a nonuniform heat flux distribution with its maximum value at the fr
ontal stagnation point of the sphere. This nonuniform distribution of
the local heat flux density causes a nonuniform distribution of the lo
cal evaporated-mass flux and vapor reaction force around the surface o
f an evaporating particle, and thus induces an additional force on the
particle. Consequently, the drag force acting on an evaporating parti
cle is always greater than that on a nonevaporating one. This addition
al drag force due to particle evaporation is more significant for nonm
etallic particles and for particle materials with lower latent heat of
evaporation and lower vapor molecular mass. It increases with increas
ing plasma temperature and with decreasing gas pressure at the high pl
asma temperatures associated with appreciable gas ionization. The drag
ratio increases with increasing electron/heavy-particle temperature r
atio at high electron temperatures for a two-temperature plasma.