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Results: 1-25/200
Authors:
BAEVA M
LUO X
SCHAFER JH
UHLENBUSCH J
ZHANG Z
Citation: M. Baeva et al., EXPERIMENTAL AND THEORETICAL-STUDIES OF A PULSED MICROWAVE EXCITED ARCF4 PLASMA/, Plasma chemistry and plasma processing, 18(4), 1998, pp. 429-446
Authors:
DIAMY AM
HOCHARD L
LEGRAND JC
RICARD A
Citation: Am. Diamy et al., CONCENTRATIONS OF ACTIVE SPECIES IN THE FLOWING AFTERGLOW OF A NITROGEN MICROWAVE PLASMA, Plasma chemistry and plasma processing, 18(4), 1998, pp. 447-460
Authors:
YU QS
YASUDA HK
Citation: Qs. Yu et Hk. Yasuda, AN OPTICAL-EMISSION STUDY ON EXPANDING LOW-TEMPERATURE CASCADE ARC PLASMAS, Plasma chemistry and plasma processing, 18(4), 1998, pp. 461-485
Authors:
FAN XB
ISHIGAKI T
Citation: Xb. Fan et T. Ishigaki, PARAMETRIC STUDY ON NITRIDATION AND CARBURIZATION OF MOSI2 POWDERS INAN INDUCTION PLASMA, Plasma chemistry and plasma processing, 18(4), 1998, pp. 487-507
Authors:
BLINOV LM
GOLOVKIN AG
KAGANOV LI
OPARIN VB
RAZHAVSKI AA
SHTERENBERG AM
VOLODKO VV
ZYN VI
Citation: Lm. Blinov et al., TETRACHLOROSILANE CONSUMPTION IN RADIO-FREQUENCY GLOW-DISCHARGE, Plasma chemistry and plasma processing, 18(4), 1998, pp. 509-533
Authors:
MOK YS
HAM SW
NAM IS
Citation: Ys. Mok et al., EVALUATION OF ENERGY-UTILIZATION EFFICIENCIES FOR SO2 AND NO REMOVAL BY PULSED CORONA DISCHARGE PROCESS, Plasma chemistry and plasma processing, 18(4), 1998, pp. 535-550
Authors:
VARDELLE A
FAUCHAIS P
DUSSOUBS B
THEMELIS NJ
Citation: A. Vardelle et al., HEAT-GENERATION AND PARTICLE INJECTION IN A THERMAL PLASMA TORCH, Plasma chemistry and plasma processing, 18(4), 1998, pp. 551-574
Authors:
HASSOUNI K
LEROY O
FARHAT S
GICQUEL A
Citation: K. Hassouni et al., MODELING OF H-2 AND H-2 CH4 MODERATE-PRESSURE MICROWAVE PLASMA USED FOR DIAMOND DEPOSITION/, Plasma chemistry and plasma processing, 18(3), 1998, pp. 325-362
Authors:
OGATA A
MIZUNO K
KUSHIYAMA S
YAMAMOTO T
Citation: A. Ogata et al., METHANE DECOMPOSITION IN A BARIUM-TITANATE PACKED-BED NONTHERMAL PLASMA REACTOR, Plasma chemistry and plasma processing, 18(3), 1998, pp. 363-373
Authors:
ZHOU LM
XUE B
KOGELSCHATZ U
ELIASSON B
Citation: Lm. Zhou et al., PARTIAL OXIDATION OF METHANE TO METHANOL WITH OXYGEN OR AIR IN A NONEQUILIBRIUM DISCHARGE PLASMA, Plasma chemistry and plasma processing, 18(3), 1998, pp. 375-393
Authors:
ZYN VI
Citation: Vi. Zyn, KINETIC IDENTIFICATION OF A MECHANISM OF COMPLEX PLASMA CHEMICAL-REACTIONS, Plasma chemistry and plasma processing, 18(3), 1998, pp. 395-408
Authors:
ELNAAS MH
MUNZ RJ
AJERSCH F
Citation: Mh. Elnaas et al., SOLID-PHASE SYNTHESIS OF CALCIUM CARBIDE IN A PLASMA REACTOR, Plasma chemistry and plasma processing, 18(3), 1998, pp. 409-427
Authors:
SIGENEGER F
GOLUBOVSKII YB
POROKHOVA IA
WINKLER R
Citation: F. Sigeneger et al., ON THE NONLOCAL ELECTRON KINETICS IN S-STRIATIONS AND P-STRIATIONS OFDC GLOW-DISCHARGE PLASMAS - I - ELECTRON ESTABLISHMENT IN STRIATION-LIKE FIELDS, Plasma chemistry and plasma processing, 18(2), 1998, pp. 153-180
Authors:
PEKKER L
Citation: L. Pekker, SIMPLE-MODEL FOR CALCULATING THE RATE CONSTANTS OF PLASMA-CHEMICAL REACTIONS IN LOW-PRESSURE DC MAGNETRON DISCHARGES, Plasma chemistry and plasma processing, 18(2), 1998, pp. 181-187
Authors:
BAYER C
VONROHR PR
Citation: C. Bayer et Pr. Vonrohr, ON THE CORRELATION BETWEEN DEPOSITION RATE AND PROCESS PARAMETERS IN REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Plasma chemistry and plasma processing, 18(2), 1998, pp. 189-214
Authors:
HSIEH LT
LEE WJ
CHEN CY
CHANG MB
CHANG HC
Citation: Lt. Hsieh et al., CONVERTING METHANE BY USING AN RF PLASMA REACTOR, Plasma chemistry and plasma processing, 18(2), 1998, pp. 215-239
Authors:
GESSER HD
HUNTER NR
PROBAWONO D
Citation: Hd. Gesser et al., THE CO2 REFORMING OF NATURAL-GAS IN A SILENT DISCHARGE REACTOR, Plasma chemistry and plasma processing, 18(2), 1998, pp. 241-245
Authors:
BUGAEV SP
KOZYREV AV
KUVSHINOV VA
SOCHUGOV NS
KHRYAPOV PA
Citation: Sp. Bugaev et al., PLASMA-CHEMICAL CONVERSION OF LOWER ALKANES WITH STIMULATED CONDENSATION OF INCOMPLETE OXIDATION-PRODUCTS, Plasma chemistry and plasma processing, 18(2), 1998, pp. 247-261
Authors:
PLANCHE MP
COUDERT JF
FAUCHAIS P
Citation: Mp. Planche et al., VELOCITY-MEASUREMENTS FOR ARC JETS PRODUCED BY A DC PLASMA SPRAY TORCH, Plasma chemistry and plasma processing, 18(2), 1998, pp. 263-283
Authors:
BILODEAU JF
POUSSE J
GLEIZES A
Citation: Jf. Bilodeau et al., A MATHEMATICAL-MODEL OF THE CARBON-ARC REACTOR FOR FULLERENE SYNTHESIS, Plasma chemistry and plasma processing, 18(2), 1998, pp. 285-303
Authors:
BORGES CFM
ASMANN M
PFENDER E
HEBERLEIN J
Citation: Cfm. Borges et al., DIAMOND DEPOSITION ON SUBSTRATES WITH DIFFERENT GEOMETRIES IN A THERMAL PLASMA REACTOR, Plasma chemistry and plasma processing, 18(2), 1998, pp. 305-324
Authors:
AUBRETON J
ELCHINGER MF
FAUCHAIS P
Citation: J. Aubreton et al., NEW METHOD TO CALCULATE THERMODYNAMIC AND TRANSPORT-PROPERTIES OF A MULTITEMPERATURE PLASMA - APPLICATION TO N-2 PLASMA, Plasma chemistry and plasma processing, 18(1), 1998, pp. 1-27
Authors:
CHEN K
EDDY TL
Citation: K. Chen et Tl. Eddy, A THERMODYNAMIC ANALYSIS OF NONEQUILIBRIUM ARGON PLASMA TORCHES, Plasma chemistry and plasma processing, 18(1), 1998, pp. 29-52
Authors:
JANKOVIC M
MOSTAGHIMI J
Citation: M. Jankovic et J. Mostaghimi, THERMALLY-INDUCED MEASUREMENT ERROR BY A WATER-COOLED ENTHALPY PROBE, Plasma chemistry and plasma processing, 18(1), 1998, pp. 53-71
Authors:
KOLMAN D
HEBERLEIN J
PFENDER E
Citation: D. Kolman et al., A 3-DIMENSIONAL 2-PHASE MODEL FOR THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION WITH LIQUID FEEDSTOCK INJECTION, Plasma chemistry and plasma processing, 18(1), 1998, pp. 73-89