A 3-DIMENSIONAL 2-PHASE MODEL FOR THERMAL PLASMA CHEMICAL-VAPOR-DEPOSITION WITH LIQUID FEEDSTOCK INJECTION

In this paper, a comprehensive model for thermal plasma chemical vapor deposition (TPCVD) with liquid feedstock injection is documented. The gas flow is assumed to be steady, of a single temperature. Radiation and charged species contributions are excluded, but extensive homogene ous and heterogeneous chemistry is included. The liquid phase is trace d by considering individual droplets. Discussion on the model's applic ation to diamond production from acetone in a hydrogen-argon plasma is included. The major conclusions are: (1) Liquid injection possesses a capability to deliver the hydrocarbon precursor directly onto the dep osition target. (2) For the case of complete evaporation of the drople t before reaching the substrate, the deposition rate is similar to tha t obtained with gaseous precursors. (3) The computational results comp are well with experimental data. The modeling results can be used to o ptimize the injection parameters with regard to the deposition rate.