TETRACHLOROSILANE CONSUMPTION IN RADIO-FREQUENCY GLOW-DISCHARGE

Citation
Lm. Blinov et al., TETRACHLOROSILANE CONSUMPTION IN RADIO-FREQUENCY GLOW-DISCHARGE, Plasma chemistry and plasma processing, 18(4), 1998, pp. 509-533
Citations number
13
Categorie Soggetti
Physics, Applied","Engineering, Chemical","Phsycs, Fluid & Plasmas
ISSN journal
02724324
Volume
18
Issue
4
Year of publication
1998
Pages
509 - 533
Database
ISI
SICI code
0272-4324(1998)18:4<509:TCIRG>2.0.ZU;2-P
Abstract
Time-resolved mass spectrometry was used for analysis of the plasma re actions in radio frequency (RF) SiCl4 and SiCl4-O-2 discharges as func tions of starting partial pressure and electrical power. Molecular con centrations of the reactants and products from SiCl4 alone and with O- 2 were obtained from the mass spectra and used for plotting the kineti c curves. The SiCl4 and O-2 consumption rates were calculated from the kinetic curves and compared with results of theoretical simulation of the reaction. Dir ect electron impact decomposition was found to be t he main pathway for pure SiCl4 conversion. On the contrary, the consum ption of SiCl4 in the SiCl4+O-2 mixtures was largely chemical. The exp erimental macrokinetics are in agreement with a model in which oxidati on is caused by the atomic oxygen.