DRY-ETCHING OF PALLADIUM THIN-FILMS IN FLUORINE-CONTAINING PLASMAS - X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION

Authors
FRACASSI F DAGOSTINO R CACUCCI A
Citation
F. Fracassi et al., DRY-ETCHING OF PALLADIUM THIN-FILMS IN FLUORINE-CONTAINING PLASMAS - X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(1), 1995, pp. 63-66
Citations number
8
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
1
Year of publication
1995
Pages
63 - 66
Database
ISI
SICI code
0734-2101(1995)13:1<63:DOPTIF>2.0.ZU;2-U