A. Kamata, NOVEL NITROGEN-SOURCE MATERIALS IN ZINC SELENIDE METALORGANIC CHEMICAL-VAPOR-DEPOSITION, Journal of crystal growth, 145(1-4), 1994, pp. 557-561
Novel nitrogen-based materials have been used as nitrogen sources in m
etalorganic chemical vapor deposition (MOCVD) grown ZnSe. Ethylazide h
as a high doping efficiency and the controllability of the doping conc
entration is good. Photoluminescence spectra at 4.2 K revealed the pre
sence of shallow acceptor levels in ZnSe. Hydrogen was incorporated in
to the ZnSe layer at a similar concentration of that of nitrogen, alth
ough the nitrogen-hydrogen bond did not exist in ethylazide. The high
resistivity of the present samples was due to the hydrogen passivation
. The formation of the N-H bond should be prevented in the growth atmo
sphere.