NOVEL NITROGEN-SOURCE MATERIALS IN ZINC SELENIDE METALORGANIC CHEMICAL-VAPOR-DEPOSITION

Authors
Citation
A. Kamata, NOVEL NITROGEN-SOURCE MATERIALS IN ZINC SELENIDE METALORGANIC CHEMICAL-VAPOR-DEPOSITION, Journal of crystal growth, 145(1-4), 1994, pp. 557-561
Citations number
5
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
145
Issue
1-4
Year of publication
1994
Pages
557 - 561
Database
ISI
SICI code
0022-0248(1994)145:1-4<557:NNMIZS>2.0.ZU;2-I
Abstract
Novel nitrogen-based materials have been used as nitrogen sources in m etalorganic chemical vapor deposition (MOCVD) grown ZnSe. Ethylazide h as a high doping efficiency and the controllability of the doping conc entration is good. Photoluminescence spectra at 4.2 K revealed the pre sence of shallow acceptor levels in ZnSe. Hydrogen was incorporated in to the ZnSe layer at a similar concentration of that of nitrogen, alth ough the nitrogen-hydrogen bond did not exist in ethylazide. The high resistivity of the present samples was due to the hydrogen passivation . The formation of the N-H bond should be prevented in the growth atmo sphere.