MONTE-CARLO SIMULATIONS IN LOW-VOLTAGE SCANNING ELECTRON-MICROSCOPY

Authors
Citation
L. Reimer et R. Senkel, MONTE-CARLO SIMULATIONS IN LOW-VOLTAGE SCANNING ELECTRON-MICROSCOPY, Optik, 98(3), 1995, pp. 85-94
Citations number
60
Categorie Soggetti
Optics
Journal title
OptikACNP
ISSN journal
00304026
Volume
98
Issue
3
Year of publication
1995
Pages
85 - 94
Database
ISI
SICI code
0030-4026(1995)98:3<85:MSILSE>2.0.ZU;2-S
Abstract
The calculation of image contrast of 1-5 keV electrons by Monte Carlo simulations needs extended scattering models. Mott-scattering cross-se ctions are essential for the elastic scattering. A comparison of metho ds using approximations and fitting parameters for Mott cross-sections shows that exact differential cross-sections should be preferred. Ine lastic scattering and energy losses along the electron trajectories ca n be considered by a modified Bethe formula for the stopping power. Ho wever, detailed electron energy-loss spectra (EELS) are needed for the consideration of straggling and the calculation of the energy spectra of backscattered and transmitted electrons, for example.