CHARACTERIZATION OF VAPOR-PHASE GROWTH USING X-RAY TECHNIQUES

Citation
Dw. Kisker et al., CHARACTERIZATION OF VAPOR-PHASE GROWTH USING X-RAY TECHNIQUES, Journal of crystal growth, 146(1-4), 1995, pp. 104-111
Citations number
16
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
146
Issue
1-4
Year of publication
1995
Pages
104 - 111
Database
ISI
SICI code
0022-0248(1995)146:1-4<104:COVGUX>2.0.ZU;2-X
Abstract
Chemical vapor deposition environments, while technologically quite im portant, are difficult to study using traditional analytical probes, s uch as electron-based techniques and optical tools. In this work, we w ill describe some of the ways in which X-rays can be applied to unders tand not only the gas phase composition through fluorescence, but also surface processes such as nucleation and diffusion.