THEORETICAL-STUDY OF MACROSTEP STABILITY UNDER TEMPERATURE-GRADIENT

Citation
An. Danilewsky et al., THEORETICAL-STUDY OF MACROSTEP STABILITY UNDER TEMPERATURE-GRADIENT, Journal of crystal growth, 146(1-4), 1995, pp. 171-176
Citations number
10
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
146
Issue
1-4
Year of publication
1995
Pages
171 - 176
Database
ISI
SICI code
0022-0248(1995)146:1-4<171:TOMSUT>2.0.ZU;2-K
Abstract
The stability of an isolated macrostep under a temperature gradient is discussed theoretically for the growth of III-V-semiconductors from a metallic solution, such as liquid phase epitaxy (LPE) and the travell ing heater method (THM). To find the distribution of solute at the sur face of one macrostep, the two-dimensional diffusion equation is solve d, taking into account anisotropic interface kinetics as an important boundary condition. By analyzing the influence of growth rates and add itional temperature gradients at the growth face it is found for the b ehavior of a macrostep, that for decreasing growth rates and for incre asing temperature gradients the macrostep gets unstable and disappears . Details about the calculation and a comparison with experimental res ults from space grown crystals are presented.