D. Hofmann et al., ON THE SUBLIMATION GROWTH OF SIC BULK CRYSTALS - DEVELOPMENT OF A NUMERICAL PROCESS MODEL, Journal of crystal growth, 146(1-4), 1995, pp. 214-219
The development of a numerical process model to simulate the sublimati
on growth of SiC bulk crystals is discussed. Radiation, conduction and
convection are considered as heat transfer mechanisms. Mass transport
by diffusion and convection is taken into account. First results on t
he simulation of heat and mass transfer in a 2 inch SiC growth set-up
show a negligible effect of convection on process conditions. Chemical
reactions in the SiC-graphite system have also been implemented into
our model. Preliminary analysis on the dependence of concentration fie
lds and growth velocity on possible chemical reaction mechanisms, e.g.
graphitization, reveal that the incorporation of chemical processes i
nto modelling is very important for an accurate description of SiC sub
limation growth.