ON THE SUBLIMATION GROWTH OF SIC BULK CRYSTALS - DEVELOPMENT OF A NUMERICAL PROCESS MODEL

Citation
D. Hofmann et al., ON THE SUBLIMATION GROWTH OF SIC BULK CRYSTALS - DEVELOPMENT OF A NUMERICAL PROCESS MODEL, Journal of crystal growth, 146(1-4), 1995, pp. 214-219
Citations number
13
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
146
Issue
1-4
Year of publication
1995
Pages
214 - 219
Database
ISI
SICI code
0022-0248(1995)146:1-4<214:OTSGOS>2.0.ZU;2-Q
Abstract
The development of a numerical process model to simulate the sublimati on growth of SiC bulk crystals is discussed. Radiation, conduction and convection are considered as heat transfer mechanisms. Mass transport by diffusion and convection is taken into account. First results on t he simulation of heat and mass transfer in a 2 inch SiC growth set-up show a negligible effect of convection on process conditions. Chemical reactions in the SiC-graphite system have also been implemented into our model. Preliminary analysis on the dependence of concentration fie lds and growth velocity on possible chemical reaction mechanisms, e.g. graphitization, reveal that the incorporation of chemical processes i nto modelling is very important for an accurate description of SiC sub limation growth.