M. Kimata et al., INTERDIFFUSION OF IN, TE AT THE INTERFACE OF MOLECULAR-BEAM EPITAXIALGROWN CDTE INSB HETEROSTRUCTURES/, Journal of crystal growth, 146(1-4), 1995, pp. 433-438
One of the serious problems for the formation of good quality interfac
es of InSb/CdTe by molecular beam epitaxy (MBE) growth is the precipit
ation of In-Te related compounds at the interface resulting from inter
diffusion of In and Te. We have tried to insert an alpha-Sn layer at t
he interface to prevent the interdiffusion and the propagation of plan
ar defects which may enhance the diffusion. In this study, proof that
an alpha-Sn layer grown at 150 degrees C prevents the interdiffusion i
s given by comparing Raman spectroscopy data on CdTe/alpha-Sn/InSb wit
h those on alpha-Sn/CdTe/InSb and CdTe/InSb structures. When the alpha
-Sn layer was grown at 220 degrees C, the Raman data showed that the p
revention of interdiffusion became imperfect, although, the in-situ ob
served reflection high energy electron diffraction (RHEED) pattern ind
icated a high quality alpha-Sn layer. An insertion of one monolayer of
Cd at the interface of alpha-Sn/CdTe improved the quality of the alph
a-Sn layer and an over pressure of Cd during the growth of CdTe improv
ed the quality of the CdTe caplayer.