METALORGANIC VAPOR-PHASE EPITAXIAL GROWN HETEROINTERFACES TO GAINP WITH GROUP-III AND GROUP-V EXCHANGE

Citation
W. Prost et al., METALORGANIC VAPOR-PHASE EPITAXIAL GROWN HETEROINTERFACES TO GAINP WITH GROUP-III AND GROUP-V EXCHANGE, Journal of crystal growth, 146(1-4), 1995, pp. 538-543
Citations number
17
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
146
Issue
1-4
Year of publication
1995
Pages
538 - 543
Database
ISI
SICI code
0022-0248(1995)146:1-4<538:MVEGHT>2.0.ZU;2-R
Abstract
Metalorganic vapor phase epitaxial grown heterointerfaces to GaxIn1-xP (x approximate to 0.5) are studied. Abruptness optimization is carrie d out by means of a gas switching procedure using a hydrogen purge bet ween AsH3 and PH3( )stabilization. X-ray analysis and scanning transmi ssion electron microscopy are used to provide detailed information abo ut interlayers and Ga-segregation from a fitting of simulated to exper imental rocking curves in comparison to atomic-number contrast images. InGaAs/InAlAs heterostructure field-effect transistors on an InP-subs trate are prepared incorporating a highly strained Ga0.5In0.5P spacer layer. Excellent transport data (mu(H300 K) > 11000 cm(2)/V.s) are pro ving that despite the strain and segregation effect in the strained te rnary the lower interface at the channel/spacer transition is highly a brupt.