Growth of CN films on Si(111) is realized by reactive ionized cluster
beam deposition (RICBD). X-ray diffraction (XRD) shows the occurrence
of new CN compound which is supposed to be beta-C3N4 in the films. Ref
lection high-energy electron diffraction (RHEED) demonstrated the coex
istence of amorphous and crystalline CN compounds. Single bonded CN an
d triple bonded CN were identified by infrared absorption spectra. X-r
ay photoelectron spectra show 20% N incorporated into the films and ce
rtify the bonding energy of C 1s and N 1s. Two peaks are observed in C
1s and N 1s core level spectra. The knoop hardness of CN films is rel
ated to accelerating voltage and ionizing current, and reaches 6200 kg
f/mm(2).