FLUX DEPENDENCE OF IN-SITU ELECTRON-TRANSPORT IN AG SI(111)/

Authors
KIMBERLIN KR TRINGIDES MC
Citation
Kr. Kimberlin et Mc. Tringides, FLUX DEPENDENCE OF IN-SITU ELECTRON-TRANSPORT IN AG SI(111)/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(2), 1995, pp. 462-466
Citations number
15
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
2
Year of publication
1995
Pages
462 - 466
Database
ISI
SICI code
0734-2101(1995)13:2<462:FDOIEI>2.0.ZU;2-X