MINIATURIZED E-BEAM WRITER -TESTING OF COMPONENTS

A new, versatile system for low energy e-beam lithography is presented . It can be operated either as a miniaturized e-beam writer or as a sc anning tunneling microscope. Switching between these two modes can be done in-situ due to an exchangeable lens stage. The second key compone nt of the system, the field emission or tunneling tip can also be exch anged in-situ. For positioning of the tip, a new stepper motor for x-, y- and z-alignment is incorporated. Its step size was assessed to be 50 nm and its lowest resonance frequency in z-direction is 6.4 kHz. Wh ile operating the system as a microcolumn, an electrostatic scanner al lows for +/-4-degrees of deflection of a 400 eV electron beam.