COMPARISONS OF ATTENUATED PSM TECHNOLOGIES USING ETCHED QUARTZ AND EMBEDDED MATERIALS

Authors
YUAN CM POL V
Citation
Cm. Yuan et V. Pol, COMPARISONS OF ATTENUATED PSM TECHNOLOGIES USING ETCHED QUARTZ AND EMBEDDED MATERIALS, Microelectronic engineering, 27(1-4), 1995, pp. 251-253
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
27
Issue
1-4
Year of publication
1995
Pages
251 - 253
Database
ISI
SICI code
0167-9317(1995)27:1-4<251:COAPTU>2.0.ZU;2-T
Abstract
Two techniques, etched quartz and embedded materials, are commonly use d today to fabricate attenuated phase shift masks (PSMs). This paper p resents measurement results on the masks and wafers to compare their l ithography performance.