SUB-HALF-MICRON CONTACT HOLE DEFINITION BY I-LINE OPTICAL LITHOGRAPHY

Authors
ARTHUR G
Citation
G. Arthur, SUB-HALF-MICRON CONTACT HOLE DEFINITION BY I-LINE OPTICAL LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 279-282
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
27
Issue
1-4
Year of publication
1995
Pages
279 - 282
Database
ISI
SICI code
0167-9317(1995)27:1-4<279:SCHDBI>2.0.ZU;2-7
Abstract
Simulation of sub-half-micron contact hole printing in conventional re sist at i-line exposure wavelength is described. Lens conditions are t hose typical of advanced stepper systems wherein numerical aperture (N A) and partial coherence, or sigma (sigma), of the projection lens can be varied to give optimum conditions for contact hole definition.