180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE

Authors
TURCU ICE REEVES CM STEVENSON JTM ROSS AWS GUNDLACH AM PREWETT P ANASTASI P KOEK B MITCHELL P LAKE P
Citation
Ice. Turcu et al., 180NM X-RAY-LITHOGRAPHY WITH A HIGH-REPETITION-RATE LASER-PLASMA SOURCE, Microelectronic engineering, 27(1-4), 1995, pp. 295-298
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
27
Issue
1-4
Year of publication
1995
Pages
295 - 298
Database
ISI
SICI code
0167-9317(1995)27:1-4<295:1XWAHL>2.0.ZU;2-M
Abstract
The laser-plasma X-ray source at Rutherford Appleton Laboratory was op erated at approximately 1 nm wavelength and 100mW average power for pr oximity printing of 180nm wide lines into 0.5 mum thick photoresist. T he resist process was used to define the gate electrode into polysilic on.