SIMPLE-MODEL OF THE LITHOGRAPHIC RESPONSE OF HATZAKIS CHEMICALLY-AMPLIFIED RESISTS

Authors
TATE PCM JONES RG MURPHY J EVERETT J
Citation
Pcm. Tate et al., SIMPLE-MODEL OF THE LITHOGRAPHIC RESPONSE OF HATZAKIS CHEMICALLY-AMPLIFIED RESISTS, Microelectronic engineering, 27(1-4), 1995, pp. 409-412
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
27
Issue
1-4
Year of publication
1995
Pages
409 - 412
Database
ISI
SICI code
0167-9317(1995)27:1-4<409:SOTLRO>2.0.ZU;2-V
Abstract
A simple mathematical model has been employed to analyze quantitativel y the crosslinking process in chemically amplified negative resists ba sed on the combination of an epoxidized novolac resin and a photoacid generator. Experimental evaluation of a number of resists employing di fferent resins has shown that sensitivity and contrast increase concom itantly. A resist formulation based on an experimental Dow resin desig nated DQ9 has demonstrated exceptional contrast and a sensitivity well matched to many e-beam systems.