H. Jansen et al., THE BLACK SILICON METHOD .2. THE EFFECT OF MASK MATERIAL AND LOADING ON THE REACTIVE ION ETCHING OF DEEP SILICON TRENCHES, Microelectronic engineering, 27(1-4), 1995, pp. 475-480
Very deep trenches in Si with smooth controllable profiles are etched
using a fluorine-based Reactive Ion Etcher (RIE). The effect of variou
s mask materials and loading on the profile is examined using the Blac
k Silicon Method. It is found that most metal layers have an almost in
finite selectivity. When the aspect ratio of the trenches is beyond fi
ve, RIE lag is found to be an important effect. Evidence is found that
this effect is caused by the bowing of incoming ions by the electrica
l field.