MICROMACHINING BY ACCELERATED NANOPARTICLE EROSION

Authors
Citation
J. Gspann, MICROMACHINING BY ACCELERATED NANOPARTICLE EROSION, Microelectronic engineering, 27(1-4), 1995, pp. 517-520
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
27
Issue
1-4
Year of publication
1995
Pages
517 - 520
Database
ISI
SICI code
0167-9317(1995)27:1-4<517:MBANE>2.0.ZU;2-1
Abstract
Impacts of nanoparticles of condensed gases, or ''gas clusters'', acce lerated to about 100 keV kinetic energy are used for eroding surfaces area selectively. The nanoparticle lithography may be assisted by chem ical reaction between the nanoparticle and the target material, leadin g to a reactive accelerated cluster erosion (RACE) which may provide v olatile reaction products. The RACE process is applied to metals like copper and gold, to semiconductors such as silicon, and to insulators like glass or quartz, giving very smooth eroded surfaces and sidewalls of adjustable inclination.