PERFORMANCE AND POTENTIAL OF ULTRATHIN ACCUMULATION-MODE SIMOX MOSFETS

Citation
O. Faynot et al., PERFORMANCE AND POTENTIAL OF ULTRATHIN ACCUMULATION-MODE SIMOX MOSFETS, I.E.E.E. transactions on electron devices, 42(4), 1995, pp. 713-719
Citations number
15
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
42
Issue
4
Year of publication
1995
Pages
713 - 719
Database
ISI
SICI code
0018-9383(1995)42:4<713:PAPOUA>2.0.ZU;2-L
Abstract
A systematic experimental investigation of the influence of the silico n film thickness on the properties of accumulation-mode SOI MOSFET's h as been performed, and the relevant original results are presented. In terface coupling mechanisms acid their effects on the major device par ameters (threshold voltages, subthreshold swing, and transconductance) are analyzed. The feasibility of ultrathin accumulation-mode SIMOX MO SFET's for future submicrometer applications is demonstrated and discu ssed. Floating-body effects, which stand as critical aspects for SOI d evices, are also investigated and the benefit of the silicon film thin ning on the breakdown behavior of accumulation-mode devices is clearly established.