OPTOELECTRONIC SYSTEM INTEGRATION ON SILICON - WAVE-GUIDES, PHOTODETECTORS, AND VLSI CMOS CIRCUITS ON ONE-CHIP

Optical waveguides, photodetectors, and VLSI CMOS circuits are integra ted monolithically in different ways: In a combined integration techni que the light-guiding film is deposited and covered with a SiO2 layer replacing standard PSG as the dielectric insulation of polysilicon and metallization. In a stacked method the waveguide fabrication starts a fter metallization and test of the CMOS circuits. Electrooptical coupl ing is performed by butt-, leaky wave-, or, mirror-coupling of wavegui des and photodetectors. To fabricate the system, SWAMI LOCOS technique is applied for monolithic integration of both, integrated optical dev ices, and microelectronic circuits. This paper discusses the integrati on technology and the results of static and dynamic measurements.