EXTREMELY FLAT SURFACES BY LIQUID-PHASE EPITAXY

Citation
Aa. Chernov et Hj. Scheel, EXTREMELY FLAT SURFACES BY LIQUID-PHASE EPITAXY, Journal of crystal growth, 149(3-4), 1995, pp. 187-195
Citations number
33
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
149
Issue
3-4
Year of publication
1995
Pages
187 - 195
Database
ISI
SICI code
0022-0248(1995)149:3-4<187:EFSBLE>2.0.ZU;2-#
Abstract
By analysis of liquid phase epitaxial (LPE) growth experiments of GaAs multiIayer structures, the incorporation rates at elementary growth s teps (kinetic coefficients) are estimated. Conditions are presented to prepare large singular surfaces with several micrometers distances be tween regular elementary steps. Such quasi atomically flat surfaces ma y become important for applications in semiconductor and superconducto r technologies, in surface physics and catalysis, as reference planes, and also as substrates for fabrication of extremely homogeneous layer s and perfect superlattices.