Within the JESSI/ESPRIT project PROMPT, a program system for the multi
dimensional simulation of semiconductor fabrication steps is being dev
eloped. The overall goal is to provide appropriate information on the
three-dimensional device geometry and dopant distributions as input to
three-dimensional device simulation. For this purpose, both existing
one- and two-dimensional process simulation programs and newly develop
ed three-dimensional simulation modules are being used. In addition to
the general concept of the PROMPT system, a brief description of the
approaches used for the three-dimensional simulation of the main proce
ss steps is given.