DEPOSITION OF DIAMOND FILMS IN A CLOSED HOT-FILAMENT CVD SYSTEM

A closed system hot filament chemical vapor deposition (CVD) reactor h as been used to deposit diamond films on silicon substrates. A fixed c harge of hydrogen gas is fed into the deposition system until the desi red deposition pressure level is reached. A solid graphite cylindrical rod held above the tungsten filament was the carbon source. System pa rameters for diamond film growth have been determined. The diamond str ucture of the films has been verified by x-ray diffraction (XRD). Morp hology typical of CVD diamond films has been observed in scanning elec tron microscopy (SEM). The quality of the diamond films has been evalu ated by micro-Raman spectroscopy.