DESIGN AND OPERATING CONSIDERATIONS FOR A WATER-COOLED CLOSE-SPACED REACTANT INJECTOR IN A PRODUCTION SCALE MOCVD REACTOR

In a previous paper, we described experimental results of the growth o f a wide range of III-V materials using a water-cooled close-spaced in jector that permits organometallic and hydride reactants to be injecte d similar to 1 cm above the hot wafer. In this paper, we describe impo rtant design and operating considerations for this new metalorganic ch emical vapor deposition (MOCVD) injector, including construction detai ls, deposition efficiency and process window considerations. Our theor etical modeling indicates that the gas flow patterns are very differen t from those in a typical rotating disk reactor. By making analytical approximations for the velocity and temperature profiles, we have deve loped a flow stability parameter and find that the thermal stability d epends on the square of the injector-to-substrate gap.