N. Carlsson et al., MOVPE GROWTH OF INP GAINAS AND GAAS/GAINP HETEROSTRUCTURES FOR ELECTRONIC TRANSPORT APPLICATIONS/, Journal of crystal growth, 170(1-4), 1997, pp. 127-131
The influence of the layer structure on the electrical properties in (
i) modulation doped InP/GaInAs quantum well samples, and, (ii) GaAs/Ga
InP resonant tunneling diodes has been investigated. The results revea
l the importance of the different scattering processes. In particular,
the influence of interface roughness scattering has been evaluated fo
r both types of structures.