INFLUENCE OF THE GROWTH TEMPERATURE AND SUBSTRATE ORIENTATION ON THE LAYER PROPERTIES OF MOVPE-GROWN (GA,IN)(AS,P) GAAS/

Citation
A. Knauer et al., INFLUENCE OF THE GROWTH TEMPERATURE AND SUBSTRATE ORIENTATION ON THE LAYER PROPERTIES OF MOVPE-GROWN (GA,IN)(AS,P) GAAS/, Journal of crystal growth, 170(1-4), 1997, pp. 281-286
Citations number
11
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
170
Issue
1-4
Year of publication
1997
Pages
281 - 286
Database
ISI
SICI code
0022-0248(1997)170:1-4<281:IOTGTA>2.0.ZU;2-Z
Abstract
The luminescence properties of In1-xGaxAsyP1-y layers and heterostruct ures grown lattice matched to GaAs by metalorganic vapour-phase epitax y (MOVPE) were studied and correlated to the crystalline properties. F or laser structures emitting around 800 nm a red-shift of the emission from the active layer (y = 0.72) grown at 680 degrees C together with an anomalous temperature behaviour and excitation dependence of the b andgap is observed. Although some degree of ordering is observed for t hick layers of this composition, polarization dependent photoluminesce nce does not indicate ordering of the quantum well to be the main reas on for this excitation dependence. Instead, interfacial In-rich layers are found to be responsible. The thickness of these interfacial layer s strongly depends on substrate misorientation and growth conditions.