Self-organized InAs quantum dot structures were prepared by low pressu
re metalorganic vapor phase epitaxy (MOVPE) using the Stranski-Krastan
ow growth mode. We present photoluminescence (PL) and atomic force mic
roscopy (AFM) studies of the transition from a 2D InAs wetting layer t
o 3D quantum sized islands. The very narrow window where this transiti
on takes place could be studied in detail by taking advantage of the s
light growth rate gradient of our MOVPE system. After the growth of a
critical layer thickness, first quantum dots occur. From the PL spectr
a obtained at different positions on the wafer, we conclude that a par
t of the wetting layer is consumed by the dot formation process. This
is further confirmed by AFM measurements. Also a qualitative correlati
on between dot density and PL intensity is described. Moreover, we obs
erved that the dot formation can be suppressed by instantaneous overgr
owth. Besides the overgrowth temperature the growth interruption betwe
en the InAs film and the GaAs cap layer was found to be of great impor
tance for the dot formation.