Selectively deposited GaInAs/InP quantum wells show extended monolayer
terraces which are significantly larger than corresponding monolayer
islands observed in the case of conventional non-selective epitaxy. We
investigated the relation between the growth conditions and the forma
tion of the monolayer step structure in lateral direction by cathodolu
minescence. The influence of the arsine supply during GaInAs growth ap
peared to be the crucial parameter. A reduced V/III ratio during GaInA
s growth results in a disappearance of the monolayer step structure. I
t is possible to control separately the vertical interface abruptness,
limited by an As/P exchange at the interface, and the lateral interfa
ce configuration (terraces).