VLSI RELIABILITY CHALLENGES - FROM DEVICE PHYSICS TO WAFER-SCALE SYSTEMS

The philosophical and practical differences between Japanese and Ameri can IC industries concerning VLSI reliability, as well as recent resea rch topics and new analysis methods such as wafer scale testing are di scussed. A new challenging approach to VLSI reliability is now greatly needed in response to the ''paradigm shift'' now being brought about by simple scaling limitations, increased process complexity, and VLSI application to advanced systems. A good example of this shift is the n ew movement from simple failure analysis by sampling the output of a m anufacturing line to the ''building-in-reliability'' approach. To purs ue this technique, greater importance will be attached to a deeper phy sical understanding (including frequent use of Computer Aided Design, CAD/ Design Automation, DA) of the significant relationships between t he input variables and product reliability, and to total concurrent en gineering from research labs to production sites. In addition, distrib utive duality control management being carried out particularly in Jap an, where duality improvement is the common concern for every employee , may be a key factor in overcoming the more difficult reliability pro blems in the coming giga-scale ICs. Furthermore, fast new VLSI testing methods and new yield-enhancing redundancy techniques, resulting in c ost reduction, will be increasingly needed to achieve high reliability for VLSIs with 10(9) devices on a single chip.