Pgy. Tsui et al., A VERSATILE HALF-MICRON COMPLEMENTARY BICMOS TECHNOLOGY FOR MICROPROCESSOR-BASED SMART POWER APPLICATIONS, I.E.E.E. transactions on electron devices, 42(3), 1995, pp. 564-570
A modular, high density 0.5 mu m Complementary BiCMOS technology with
integrated high-voltage Lateral Diffused MOS (LDMOS) and conductivity
modulated Lateral Insulated Gate Bipolar Transistor (LIGBT) structures
designed for high performance, multi-functional integrated circuit ap
plications is described. The advantages of VLSI processing and 0.5 mu
m compatible layout rules have been applied to the design and fabricat
ion of the tight-pitch high-voltage devices without sacrificing the pe
rformance of 0.5 mu m dual-poly (N+/P+) gate CMOS and complementary ve
rtical bipolar transistors. Single chip integration of VLSI microproce
ssors with high-voltage and/or high-current input and output functions
for ''Smart Power'' applications can be achieved using this technolog
y.