A VERSATILE HALF-MICRON COMPLEMENTARY BICMOS TECHNOLOGY FOR MICROPROCESSOR-BASED SMART POWER APPLICATIONS

Citation
Pgy. Tsui et al., A VERSATILE HALF-MICRON COMPLEMENTARY BICMOS TECHNOLOGY FOR MICROPROCESSOR-BASED SMART POWER APPLICATIONS, I.E.E.E. transactions on electron devices, 42(3), 1995, pp. 564-570
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
42
Issue
3
Year of publication
1995
Pages
564 - 570
Database
ISI
SICI code
0018-9383(1995)42:3<564:AVHCBT>2.0.ZU;2-3
Abstract
A modular, high density 0.5 mu m Complementary BiCMOS technology with integrated high-voltage Lateral Diffused MOS (LDMOS) and conductivity modulated Lateral Insulated Gate Bipolar Transistor (LIGBT) structures designed for high performance, multi-functional integrated circuit ap plications is described. The advantages of VLSI processing and 0.5 mu m compatible layout rules have been applied to the design and fabricat ion of the tight-pitch high-voltage devices without sacrificing the pe rformance of 0.5 mu m dual-poly (N+/P+) gate CMOS and complementary ve rtical bipolar transistors. Single chip integration of VLSI microproce ssors with high-voltage and/or high-current input and output functions for ''Smart Power'' applications can be achieved using this technolog y.