EFFECTS OF SUBSTRATE SMOOTHNESS ON THE MICROSTRUCTURE OF YBA2CU3O7-X Y2O3/YBA2CU3O7-X TRILAYERS/

Authors
WAYTENA GL HOFF HA WOLCOTT RR BROUSSARD PR VOLD CL LEE CB
Citation
Gl. Waytena et al., EFFECTS OF SUBSTRATE SMOOTHNESS ON THE MICROSTRUCTURE OF YBA2CU3O7-X Y2O3/YBA2CU3O7-X TRILAYERS/, Journal of electronic materials, 24(3), 1995, pp. 189-195
Citations number
16
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
Journal title
Journal of electronic materials → ACNP
ISSN journal
03615235
Volume
24
Issue
3
Year of publication
1995
Pages
189 - 195
Database
ISI
SICI code
0361-5235(1995)24:3<189:EOSSOT>2.0.ZU;2-F
Abstract
Transmission electron microscopy was used to analyze the microstructur e of YBa2Cu3O7-x/Y2O3/YBa2Cu3O7-x trilayer structures deposited by off -axis sputtering on MgO substrates with varying degrees of roughness. Substrate surface hillocks with a peak-to-valley height of about 4.5 n m were found to contribute to strain that extended through the film an d disrupted the smoothness of the Y2O3 layer. In some cases, these hil locks served as nucleation sites for yttria precipitates. Such defects may seriously jeopardize the realization of weak-link Josephson junct ions.