Yp. Chen et al., SUPPRESSION OF TWIN FORMATION IN CDTE(111)B EPILAYERS GROWN BY MOLECULAR-BEAM EPITAXY ON MISORIENTED SI(001), Journal of electronic materials, 24(5), 1995, pp. 475-481
CdTe(111)B layers have been grown on misoriented Si(001). Twin formati
on inside CdTe(111)B layer is very sensitive to the substrate tilt dir
ection. When Si(001) is tilted toward [110] or [100], a fully twinned
layer is obtained. When Si(001) is tilted toward a direction significa
ntly away from [110], a twin-free layer is obtained. Microtwins inside
the CdTe(111)B layers are overwhelmingly dominated by the lamellar tw
ins. CdTe(111)B layers always start with heavily lamellar twinning. Fo
r twin-free layers, the lamellar twins are gradually suppressed and gi
ve way to twin-free CdTe(111)B layer. The major driving forces for sup
pressing the lamellar twinning are the preferential orientation of CdT
e[11 ($) over bar 2] along Si[1 ($) over bar 10] and lattice relaxatio
n. Such preferential orientation is found to exist for the CdTe(111)B
layers grown on Si(001) tilted toward a direction between [110] and [1
00].