SUPPRESSION OF TWIN FORMATION IN CDTE(111)B EPILAYERS GROWN BY MOLECULAR-BEAM EPITAXY ON MISORIENTED SI(001)

Citation
Yp. Chen et al., SUPPRESSION OF TWIN FORMATION IN CDTE(111)B EPILAYERS GROWN BY MOLECULAR-BEAM EPITAXY ON MISORIENTED SI(001), Journal of electronic materials, 24(5), 1995, pp. 475-481
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
24
Issue
5
Year of publication
1995
Pages
475 - 481
Database
ISI
SICI code
0361-5235(1995)24:5<475:SOTFIC>2.0.ZU;2-O
Abstract
CdTe(111)B layers have been grown on misoriented Si(001). Twin formati on inside CdTe(111)B layer is very sensitive to the substrate tilt dir ection. When Si(001) is tilted toward [110] or [100], a fully twinned layer is obtained. When Si(001) is tilted toward a direction significa ntly away from [110], a twin-free layer is obtained. Microtwins inside the CdTe(111)B layers are overwhelmingly dominated by the lamellar tw ins. CdTe(111)B layers always start with heavily lamellar twinning. Fo r twin-free layers, the lamellar twins are gradually suppressed and gi ve way to twin-free CdTe(111)B layer. The major driving forces for sup pressing the lamellar twinning are the preferential orientation of CdT e[11 ($) over bar 2] along Si[1 ($) over bar 10] and lattice relaxatio n. Such preferential orientation is found to exist for the CdTe(111)B layers grown on Si(001) tilted toward a direction between [110] and [1 00].