SUBTHRESHOLD CHARACTERISTICS OF FULLY DEPLETED SUBMICROMETER SOI MOSFETS

Authors
Citation
Tc. Hsiao et Jcs. Woo, SUBTHRESHOLD CHARACTERISTICS OF FULLY DEPLETED SUBMICROMETER SOI MOSFETS, I.E.E.E. transactions on electron devices, 42(6), 1995, pp. 1120-1125
Citations number
17
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
42
Issue
6
Year of publication
1995
Pages
1120 - 1125
Database
ISI
SICI code
0018-9383(1995)42:6<1120:SCOFDS>2.0.ZU;2-1
Abstract
In this paper, an analytic current-voltage model in the subthreshold r egime for submicrometer fully depleted (FD) silicon-on-insulator (SOI) MOSFET's is presented. This model takes into account the dependence o f the effective depleted charge on the drain bias and the voltage drop in the substrate region underneath the buried oxide. In addition to p redicting accurate subthreshold current-voltage characteristics and su bthreshold slope, this model can be used to predict important Short Ch annel Effects (SCE) such as the threshold voltage roll-off and Drain-I nduced Barrier Lowering (DIBL), This model is verified by comparison t o a two-dimensional device simulator, MEDICI. Good agreement is obtain ed for SOI channel lengths down to 0.25 mu m.