Tc. Hsiao et Jcs. Woo, SUBTHRESHOLD CHARACTERISTICS OF FULLY DEPLETED SUBMICROMETER SOI MOSFETS, I.E.E.E. transactions on electron devices, 42(6), 1995, pp. 1120-1125
In this paper, an analytic current-voltage model in the subthreshold r
egime for submicrometer fully depleted (FD) silicon-on-insulator (SOI)
MOSFET's is presented. This model takes into account the dependence o
f the effective depleted charge on the drain bias and the voltage drop
in the substrate region underneath the buried oxide. In addition to p
redicting accurate subthreshold current-voltage characteristics and su
bthreshold slope, this model can be used to predict important Short Ch
annel Effects (SCE) such as the threshold voltage roll-off and Drain-I
nduced Barrier Lowering (DIBL), This model is verified by comparison t
o a two-dimensional device simulator, MEDICI. Good agreement is obtain
ed for SOI channel lengths down to 0.25 mu m.