SURFACE RECONSTRUCTION OF SULFUR-TERMINATED GAAS(001) OBSERVED DURINGANNEALING PROCESS BY SCANNING-TUNNELING-MICROSCOPY

Citation
S. Tsukamoto et N. Koguchi, SURFACE RECONSTRUCTION OF SULFUR-TERMINATED GAAS(001) OBSERVED DURINGANNEALING PROCESS BY SCANNING-TUNNELING-MICROSCOPY, Journal of crystal growth, 150(1-4), 1995, pp. 33-37
Citations number
16
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
1
Pages
33 - 37
Database
ISI
SICI code
0022-0248(1995)150:1-4<33:SROSGO>2.0.ZU;2-A
Abstract
The surface reconstruction of in-situ prepared sulfur-terminated (S-te rminated) and sulfur-protected (S-protected) GaAs(001) is studied by s canning tunneling microscopy (STM) at high temperatures of up to 260 d egrees C. We demonstrate a new reordering process from the (4 x 6) Ga- stabilized surface to the (2 x 6) S-stabilized surface and a novel met hod of air protection using a S passivation layer. Moreover, the in-si tu observation of the annealing process of this S-protection layer is performed by high-temperature STM, avoiding the adsorption from enviro nments and verifying that the (2 x 6) structure still becomes dominant on the S-terminated GaAs(001) surface without the effects of As atoms .