W. Braun et K. Ploog, SIMULTANEOUS MONITORING OF DIFFERENT SURFACE PROCESSES ON DIFFERENT STREAKS OF THE REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION PATTERN, Journal of crystal growth, 150(1-4), 1995, pp. 62-67
The recently discovered additional phase shift of reflection high ener
gy electron diffraction (RHEED) intensity oscillations at heterointerf
aces significantly deepens the analysis of surface dynamics using RHEE
D. The evolution of the phase shift is different for the (01) and (00)
streaks of the same RHEED pattern because the two streaks show a diff
erent sensitivity on surface morphology: whereas diffraction into (01)
streaks requires good lateral periodicity of the surface, no lateral
periodicity is required for diffraction into the (00) streak. Therefor
e, the signal on the (00) streak should be most sensitive towards step
s running along the electron beam, while the (01) beams sample mostly
terraces. We demonstrate the potential and sensitivity of this effect
using GaAs-AlAs(100) interfaces and discuss its compatibility with cur
rent models of RHEED oscillations. The effects is then applied to char
acterize the incorporation dynamics of segregating and non-segregating
dopants.