SIMULTANEOUS MONITORING OF DIFFERENT SURFACE PROCESSES ON DIFFERENT STREAKS OF THE REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION PATTERN

Authors
Citation
W. Braun et K. Ploog, SIMULTANEOUS MONITORING OF DIFFERENT SURFACE PROCESSES ON DIFFERENT STREAKS OF THE REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION PATTERN, Journal of crystal growth, 150(1-4), 1995, pp. 62-67
Citations number
15
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
1
Pages
62 - 67
Database
ISI
SICI code
0022-0248(1995)150:1-4<62:SMODSP>2.0.ZU;2-A
Abstract
The recently discovered additional phase shift of reflection high ener gy electron diffraction (RHEED) intensity oscillations at heterointerf aces significantly deepens the analysis of surface dynamics using RHEE D. The evolution of the phase shift is different for the (01) and (00) streaks of the same RHEED pattern because the two streaks show a diff erent sensitivity on surface morphology: whereas diffraction into (01) streaks requires good lateral periodicity of the surface, no lateral periodicity is required for diffraction into the (00) streak. Therefor e, the signal on the (00) streak should be most sensitive towards step s running along the electron beam, while the (01) beams sample mostly terraces. We demonstrate the potential and sensitivity of this effect using GaAs-AlAs(100) interfaces and discuss its compatibility with cur rent models of RHEED oscillations. The effects is then applied to char acterize the incorporation dynamics of segregating and non-segregating dopants.