MOLECULAR-DYNAMICS SIMULATION OF (100)INGAAS GAAS STRAINED-LAYER RELAXATION PROCESSES/

Citation
Pa. Ashu et al., MOLECULAR-DYNAMICS SIMULATION OF (100)INGAAS GAAS STRAINED-LAYER RELAXATION PROCESSES/, Journal of crystal growth, 150(1-4), 1995, pp. 176-179
Citations number
18
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
1
Pages
176 - 179
Database
ISI
SICI code
0022-0248(1995)150:1-4<176:MSO(GS>2.0.ZU;2-4
Abstract
Molecular dynamics simulations on In1-xGaxAs/GaAs(100) systems are per formed showing the dynamics of threading dislocations in the overlayer s and the formation of misfit dislocations at the heterojunction inter face. The developed code, using a modified Tersoff potential, simulate s the threading dislocation dynamics in the InGaAs overlayer, and also the formation of interface misfit dislocations. Values for critical t hicknesses are predicted and the atomic structure of the dislocation c ores are determined.