THE INJECTED CARBON IMPURITIES IN INTERMIXED GAAS ALAS MULTIPLE-QUANTUM WELLS DURING THERMAL-TREATMENT/

Citation
Yt. Oh et al., THE INJECTED CARBON IMPURITIES IN INTERMIXED GAAS ALAS MULTIPLE-QUANTUM WELLS DURING THERMAL-TREATMENT/, Journal of crystal growth, 150(1-4), 1995, pp. 256-260
Citations number
25
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
1
Pages
256 - 260
Database
ISI
SICI code
0022-0248(1995)150:1-4<256:TICIII>2.0.ZU;2-F
Abstract
Photoluminescence (PL) measurements were performed in order to investi gate the carbon impurity effects on the intermixing behavior of GaAs/A lAs multiple quantum wells (MQWs) grown by molecular beam epitaxy. The GaAs/AlAs MQWs were annealed with a carbon source in a furnace anneal ing system. The PL spectra show that the magnitude of the intermixing of Al and Ga induced by thermal annealing in GaAs/AlAs MQWs increases with depth. The nonuniformity of the intermixing as a function of the depth originated from the carbon impurities which were injected during thermal treatment.