THE GROWTH AND PHYSICS OF ULTRA-HIGH-MOBILITY 2-DIMENSIONAL HOLE GAS ON (311)A GAAS SURFACE

Citation
M. Henini et al., THE GROWTH AND PHYSICS OF ULTRA-HIGH-MOBILITY 2-DIMENSIONAL HOLE GAS ON (311)A GAAS SURFACE, Journal of crystal growth, 150(1-4), 1995, pp. 451-454
Citations number
11
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
1
Pages
451 - 454
Database
ISI
SICI code
0022-0248(1995)150:1-4<451:TGAPOU>2.0.ZU;2-0
Abstract
We report on the molecular beam epitaxy growth of modulation-doped GaA s-(Ga,Al)As heterostructures on the (311)A GaAs surface using silicon as the acceptor. Two-dimensional hole gases (2DHGs) with low-temperatu re hole mobility exceeding 1.2 x 10(6) cm(2) V-1 s(-1) with carrier co ncentrations as low as 0.8 x 10(11) cm(-2) have been obtained. This ho le mobility is the highest ever observed at such low densities by any growth technique. We also report the first observation of persistent p hotoconductivity in a 2DHG. An analysis of the number density and temp erature dependence of the mobility leads us to conclude that the mobil ity is limited by phonon scattering above similar to 4 K and interface scattering at lower temperatures.