Effects of atomic hydrogen on the growth of lattice-mismatched InAs/Ga
As and GaAs/InP systems have been investigated. The irradiation of ato
mic H has resulted in a delay of the onset of formation of three-dimen
sional islands maintaining flat surface morphology and increase of the
critical layer thickness (CLT) from 4 to 10 Angstrom in the case of t
he InAs/GaAs system. The effect of atomic H was shown to be dependent
on the growth conditions such as the growth temperature and V/III flux
ratio. The increase of CLT with atomic H irradiation may be explained
by the uniform distribution of the total misfit stress in the plane o
f the surface as a result of enhanced two-dimensional growth by atomic
H acting as a surfactant.