CHEMICAL BEAM EPITAXIAL-GROWTH OF HIGH OPTICAL-QUALITY ALGAAS - THE INFLUENCE OF PRECURSOR PURITY ON MATERIAL PROPERTIES

Citation
Rw. Freer et al., CHEMICAL BEAM EPITAXIAL-GROWTH OF HIGH OPTICAL-QUALITY ALGAAS - THE INFLUENCE OF PRECURSOR PURITY ON MATERIAL PROPERTIES, Journal of crystal growth, 150(1-4), 1995, pp. 539-545
Citations number
19
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
1
Pages
539 - 545
Database
ISI
SICI code
0022-0248(1995)150:1-4<539:CBEOHO>2.0.ZU;2-G
Abstract
The influence of source precursor purity on the quality of resulting c hemical beam epitaxy (CBE) grown AlGaAs epilayers has been investigate d. A close correlation has been established between the presence of tr ace quantities of diethyl ether in a precursor and consequent oxygen c ontamination of AlGaAs. Careful selection and purification of the prec ursors to reduce ether contamination has generated significant improve ments in both the optical and electrical properties of CBE-grown AlGaA s, such that it is now directly comparable with high quality molecular beam epitaxy (MBE) and metalorganic vapour phase epitaxy (MOVPE) grow n material.