THE IMPACT OF TECHNOLOGY SCALING ON ESD ROBUSTNESS AND PROTECTION CIRCUIT-DESIGN

Citation
A. Amerasekera et C. Duvvury, THE IMPACT OF TECHNOLOGY SCALING ON ESD ROBUSTNESS AND PROTECTION CIRCUIT-DESIGN, IEEE transactions on components, packaging, and manufacturing technology. Part A, 18(2), 1995, pp. 314-320
Citations number
31
Categorie Soggetti
Engineering, Eletrical & Electronic","Engineering, Manufacturing","Material Science
ISSN journal
10709886
Volume
18
Issue
2
Year of publication
1995
Pages
314 - 320
Database
ISI
SICI code
1070-9886(1995)18:2<314:TIOTSO>2.0.ZU;2-U
Abstract
The trends in ESD robustness as a function of technology scaling, for feature sizes down to 0.25 mu m, have been experimentally determined u sing single finger nMOS transistors and Full ESD protection circuits, It is shown that as feature sizes are reduced, good ESD performance ca n be obtained provided the negative effects of the shallower junctions are offset by the positive effects of the reduction in the effective channel lengths, Hence, processes and protection circuits with feature sizes as small as 0.25 mu m can be developed without degrading ESD ro bustness.