A. Amerasekera et C. Duvvury, THE IMPACT OF TECHNOLOGY SCALING ON ESD ROBUSTNESS AND PROTECTION CIRCUIT-DESIGN, IEEE transactions on components, packaging, and manufacturing technology. Part A, 18(2), 1995, pp. 314-320
The trends in ESD robustness as a function of technology scaling, for
feature sizes down to 0.25 mu m, have been experimentally determined u
sing single finger nMOS transistors and Full ESD protection circuits,
It is shown that as feature sizes are reduced, good ESD performance ca
n be obtained provided the negative effects of the shallower junctions
are offset by the positive effects of the reduction in the effective
channel lengths, Hence, processes and protection circuits with feature
sizes as small as 0.25 mu m can be developed without degrading ESD ro
bustness.