Electrical stress of n-type metal - tunnel oxide - silicon (MTOS) diod
es by applying a positive voltage to the metal results in the appearan
ce of unstable positive charge in the oxide. This charge is observed b
y an increase in the direct tunnel current as well as a negative shift
of the capacitance-voltage (C-V) characteristic. Effects similar to t
hese have previously been observed for p-type MTOS diodes stressed wit
h negative bias. This similarity makes injection of holes a less likel
y candidate for controlling the charging profess.