ELECTRICAL INSTABILITY OF ULTRATHIN THERMAL OXIDES ON SILICON

Citation
P. Lundgren et al., ELECTRICAL INSTABILITY OF ULTRATHIN THERMAL OXIDES ON SILICON, Microelectronic engineering, 28(1-4), 1995, pp. 67-70
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
28
Issue
1-4
Year of publication
1995
Pages
67 - 70
Database
ISI
SICI code
0167-9317(1995)28:1-4<67:EIOUTO>2.0.ZU;2-C
Abstract
Electrical stress of n-type metal - tunnel oxide - silicon (MTOS) diod es by applying a positive voltage to the metal results in the appearan ce of unstable positive charge in the oxide. This charge is observed b y an increase in the direct tunnel current as well as a negative shift of the capacitance-voltage (C-V) characteristic. Effects similar to t hese have previously been observed for p-type MTOS diodes stressed wit h negative bias. This similarity makes injection of holes a less likel y candidate for controlling the charging profess.