STRAIN-INDUCED LATERAL BAND-GAP MODULATION IN SI1-XGEX SI QUANTUM-WELL AND QUANTUM-WIRE STRUCTURES/
Citation
N. Usami et al., STRAIN-INDUCED LATERAL BAND-GAP MODULATION IN SI1-XGEX SI QUANTUM-WELL AND QUANTUM-WIRE STRUCTURES/, Journal of crystal growth, 150(1-4), 1995, pp. 1065-1069
Categorie Soggetti
Crystallography
SICI code
0022-0248(1995)150:1-4<1065:SLBMIS>2.0.ZU;2-V
Abstract
We demonstrate two methods to induce lateral band gap modulation in bu
ried Si1-xGex/Si quantum well structures (QWs). The basic feature of t
he first one is to utilize the generation of inhomogeneous strain fiel
d due to two-dimensional to three-dimensional growth mode transition o
f SiGe/Si heterostructures in gas-source molecular beam epitaxy. The s
econd one is to grow SiGe/Si QWs directly on artificially-v-grooved Si
substrates. The both were found to be useful for inducing lateral ban
d gap modulation as evidenced by photoluminescence spectroscopy.