STRAIN-INDUCED LATERAL BAND-GAP MODULATION IN SI1-XGEX SI QUANTUM-WELL AND QUANTUM-WIRE STRUCTURES/

Citation
N. Usami et al., STRAIN-INDUCED LATERAL BAND-GAP MODULATION IN SI1-XGEX SI QUANTUM-WELL AND QUANTUM-WIRE STRUCTURES/, Journal of crystal growth, 150(1-4), 1995, pp. 1065-1069
Citations number
14
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
2
Pages
1065 - 1069
Database
ISI
SICI code
0022-0248(1995)150:1-4<1065:SLBMIS>2.0.ZU;2-V
Abstract
We demonstrate two methods to induce lateral band gap modulation in bu ried Si1-xGex/Si quantum well structures (QWs). The basic feature of t he first one is to utilize the generation of inhomogeneous strain fiel d due to two-dimensional to three-dimensional growth mode transition o f SiGe/Si heterostructures in gas-source molecular beam epitaxy. The s econd one is to grow SiGe/Si QWs directly on artificially-v-grooved Si substrates. The both were found to be useful for inducing lateral ban d gap modulation as evidenced by photoluminescence spectroscopy.