CHARACTERIZATION OF FERROELECTRIC BAMGF4 FILMS GROWN ON ALGAAS GAAS(100) HIGH-ELECTRON-MOBILITY TRANSISTOR STRUCTURES/

Citation
Si. Ohmi et al., CHARACTERIZATION OF FERROELECTRIC BAMGF4 FILMS GROWN ON ALGAAS GAAS(100) HIGH-ELECTRON-MOBILITY TRANSISTOR STRUCTURES/, Journal of crystal growth, 150(1-4), 1995, pp. 1104-1107
Citations number
5
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
150
Issue
1-4
Year of publication
1995
Part
2
Pages
1104 - 1107
Database
ISI
SICI code
0022-0248(1995)150:1-4<1104:COFBFG>2.0.ZU;2-D
Abstract
Ferroelectric BaMgF4 films have been grown on AlGaAs/GaAs(100) high-el ectron-mobility transistor (HEMT) structures. BaMgF4 films in which th e direction of spontaneous polarization has a finite angle to the subs trate surface can be obtained on the HEMT structure at growth temperat ures of 500-600 degrees C, However, it is shown that the growth temper ature is limited to about 550 degrees C, because the AlGaAs/GaAs inter face becomes disordered by the diffusion of Mg atoms into the HEMT str ucture when the growth temperature is 600 degrees C.