CRYSTAL DEFECTS AND INTERDIFFUSION BEHAVIOR OF HG1-XCDXTE (100)CDTE EPITAXIAL LAYERS GROWN BY CHEMICAL-VAPOR TRANSPORT/

Citation
Yr. Ge et H. Wiedemeier, CRYSTAL DEFECTS AND INTERDIFFUSION BEHAVIOR OF HG1-XCDXTE (100)CDTE EPITAXIAL LAYERS GROWN BY CHEMICAL-VAPOR TRANSPORT/, Journal of electronic materials, 23(11), 1994, pp. 1221-1227
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
11
Year of publication
1994
Pages
1221 - 1227
Database
ISI
SICI code
0361-5235(1994)23:11<1221:CDAIBO>2.0.ZU;2-1
Abstract
Crystal defects of chemical vapor transport grown Hg1-xCdxTe on (100) CdTe structures have been investigated using chemical etching, wavelen gth-dispersive spectroscopy, x-ray rocking curve, and scanning electro n microscopy methods. The results indicate that the origin and spatial distribution of the misfit dislocations can be attributed to both the lattice parameter misfit and the inevitable interdiffusion occurring between the substrate and the epitaxial layer. It is proposed that the interdiffusion of Hg along the [($) over bar 100] direction is enhanc ed by dislocation channels and other defect cores along or near this d irection owing to defects on the initial surface of the CdTe substrate . The results indicate that the subgrain boundaries in Hg1-xCdxTe are caused by slight misorientation of the lattices and polygonization of the defects during epitaxial layer growth, and by the propagation of t he subgrain boundaries existing in the CdTe substrate.